ʻO 99.95% Maʻemaʻe kiʻekiʻe no ka ʻoihana ʻenehana Atomic maikaʻi maikaʻi i ka lole pale pale Tantalum Rod / Bar Tantalum Products
Nā Kūlana Huahana
| Inoa Huahana | 99.95% Tantalum ingot bar mea kūʻai aku ro5400 tantalum kumu kūʻai |
| Maemae | 99.95% min |
| Papa | R05200, R05400, R05252, RO5255, R05240 |
| Kūlana | ASTM B365 |
| Nui | Dia(1~25)xMax3000mm |
| Kūlana | 1.Hot-rolled / Cold-rolled; 2. Alkaline Cleaning; 3.Electrolytic Polish; 4.Machining, wili; 5. Stress kōkua annealing. |
| Waiwai mīkini (Annealed) | Papa; Ka ikaika tensile min; min elongation, % |
| (UNS), psi (MPa), psi(MPa)(2%), (1in. ka loa ana) | |
| (RO5200, RO5400), 30000 (207), 20000 (138), 20 | |
| Ta-10W (RO5255), 70000 (482), 60000 (414),15 | |
| Ta-2.5W (RO5252), 40000 (276), 30000 (207), 20 | |
| Ta-40Nb (RO5240), 35000 (241), 20000 (138), 25 | |
| Nā huahana i hoʻopilikino ʻia | Wahi a ke kaha kiʻi, Nā koi kūikawā e ʻae ʻia e ka mea hoʻolako a me ka mea kūʻai aku. |
Hōʻike
| Anawaena | Hoʻomanawanui anawaena | Ka lōʻihi | Hoʻomanawanui | |||
| lāʻau kalaiwa | Nā lāʻau i hoʻokuʻu ʻia | lāʻau ʻōwili | koʻokoʻo lepo | |||
| 3.0-4.5 | ±0.05 | - | ±0.05 | - | 500-1500 | + 5 |
| >4.5-6.5 | ±0.10 | - | ±0.10 | - | 500-1500 | + 5 |
| >6.5-10.0 | ±0.15 | - | ±0.15 | - | 400-1500 | + 5 |
| >10-16 | ±0.20 | - | ±0.20 | - | 300-1200 | + 5 |
| >16-18 | ±1.0 | - | - | ±0.30 | 200-2000 | + 20 |
| >18-25 | ±1.5 | ±1.0 | - | ±0.40 | 200-2000 | + 20 |
| >25-40 | ±2.0 | ±1.5 | - | ±0.50 | 150-4000 | + 20 |
| >40-50 | ±2.5 | ±2.0 | - | ±0.60 | 100-3000 | + 20 |
| >50-65 | ±3.0 | ±2.0 | - | ±0.80 | 100-1500 | + 20 |
PapaⅠKemeka Hui o Tantalum Rod
| Kemika ppm | ||||||||||||
| wehewehe | Mea nui | Ka nui o nā haumia | ||||||||||
| Ta | Nb | Fe | Si | Ni | W | Mo | Ti | O | C | H | N | |
| Ta1 | Koena | 300 | 40 | 30 | 20 | 40 | 40 | 20 | 150 | 40 | 15 | 20 |
| Ta2 | Koena | 800 | 100 | 100 | 50 | 200 | 200 | 50 | 200 | 100 | 15 | 100 |
| TaNb3 | Koena | <35000 | 100 | 100 | 50 | 200 | 200 | 50 | 200 | 100 | 15 | 100 |
| TaNb20 | Koena | 170000- 230000 | 100 | 100 | 50 | 200 | 200 | 50 | 200 | 100 | 15 | 100 |
| Ta2.5W | Koena | 400 | 50 | 30 | 20 | 30000 | 60 | 20 | 150 | 50 | 15 | 60 |
| Ta10W | Koena | 400 | 50 | 30 | 20 | 110000 | 60 | 20 | 150 | 50 | 15 | 60 |
Papa Ⅱ ʻAe ʻia nā ʻano like ʻole i ke anawaena no nā koʻokoʻo Tantalum
| Anawaena, iniha (mm) | Hoʻomanawanui, +/-ini (mm) |
| 0.125~0.187 koena (3.175~4.750) | 0.003 (0.076) |
| 0.187~0.375 koena (4.750~9.525) | 0.004 (0.102) |
| 0.375~0.500 keu (9.525~12.70) | 0.005 (0.127) |
| 0.500~0.625 excl (12.70~15.88) | 0.007 (0.178) |
| 0.625~0.750 excl (15.88~19.05) | 0.008 (0.203) |
| 0.750~1.000 keu (19.05~25.40) | 0.010 (0.254) |
| 1.000~1.500 keu (25.40~38.10) | 0.015 (0.381) |
| 1.500~2.000 excl (38.10~50.80) | 0.020 (0.508) |
| 2.000~2.500 excl (50.80~63.50) | 0.030 (0.762) |
Palapala noi
Nā Capacitors; nā implants a me nā mea kani; nā nozzles ink jet.
Hoʻohana ʻia i nā mea hana hale hana.
Hoʻohana ʻia ma ke ʻano he pani no ka platinum.
Hoʻohana ʻia i ka hana ʻana i nā alloys super a me ka hoʻoheheʻe electron-beam.
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